The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Mar. 23, 2012
Federico Bellin, The Woodlands, TX (US);
Vamsee Chintamaneni, Houston, TX (US);
Federico Bellin, The Woodlands, TX (US);
Vamsee Chintamaneni, Houston, TX (US);
VAREL INTERNATIONAL IND., L.P., Carrollton, TX (US);
Abstract
A method to leach a component that includes a polycrystalline structure. The method includes obtaining the component having the polycrystalline structure. The polycrystalline structure includes catalyst material deposited therein. The method also includes performing a leaching process on the polycrystalline structure to an intermediate leaching depth. The leaching process removes at least a portion of the catalyst material from the polycrystalline structure and forms one or more by-product materials deposited therein. The method also includes performing a cleaning process on the polycrystalline structure, which removes at least a portion of the by-product materials. The leaching process and the cleaning process are iteratively continued until the intermediate leaching depth reaches a desired leaching depth, both of which are measured from one end of the polycrystalline structure. The desired leaching depth is greater than at least one intermediate leaching depth.