The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Feb. 16, 2008
Andreas K. Berger, Donostia-San Sebastian, ES;
Yoshihiro Ikeda, San Jose, CA (US);
Byron H. Lengsfield, Iii, Gilroy, CA (US);
David T. Margulies, Salinas, CA (US);
Ernesto E. Marinero, Saratoga, CA (US);
Andreas K. Berger, Donostia-San Sebastian, ES;
Yoshihiro Ikeda, San Jose, CA (US);
Byron H. Lengsfield, III, Gilroy, CA (US);
David T. Margulies, Salinas, CA (US);
Ernesto E. Marinero, Saratoga, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
Methods of fabricating perpendicular magnetic recording media are disclosed. The multilayer structures of the perpendicular magnetic recording media are fabricated by varying the sputtering conditions (i.e., pressure, sputtering gas, etc) in a single sputtering module so that multiple sputtering modules are not needed to form the multilayer structures. These fabrication methods allow sputtering tools with a limited number of chambers, which were designed for the manufacture of longitudinal media, to be used to efficiently produce perpendicular media architectures which heretofore required a large number of sputtering modules. It is further shown that media structures involving a geometric weak-link architecture are suited for these fabrication techniques.