The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Nov. 30, 2012
Applicant:
Platit A.s., Sumperk, CZ;
Inventors:
Assignee:
Platit A.S., , CZ;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/32 (2006.01); C23C 14/35 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C23C 14/0605 (2013.01); C23C 14/0641 (2013.01); C23C 14/08 (2013.01); C23C 14/325 (2013.01); C23C 14/35 (2013.01); C23C 14/54 (2013.01); C23C 14/564 (2013.01); H01J 37/32055 (2013.01); H01J 37/3266 (2013.01); H01J 37/32422 (2013.01); H01J 37/32871 (2013.01); H01J 37/3405 (2013.01); H01J 37/3426 (2013.01); H01J 37/3458 (2013.01);
Abstract
Vacuum deposition apparatus including cathodic arc source for application of coatings on the substrate. Cathodic arc source comprises focusing magnetic source for generating magnetic field, arc cathode containing film forming material and anode. The focusing magnetic source is placed between arc cathode and substrate. Arc spot generated on the cathode evaporation surface is kept by the magnetic field lines in the place where the magnetic field lines are perpendicular to the cathode surface.