The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Dec. 23, 2008
Applicants:

Juergen Bruch, Nidderau, DE;

Elisabeth Sommer, Alzenau, DE;

Uwe Hoffmann, Alzenau, DE;

Manuel Dieguez-campo, Hanau, DE;

Inventors:

Juergen Bruch, Nidderau, DE;

Elisabeth Sommer, Alzenau, DE;

Uwe Hoffmann, Alzenau, DE;

Manuel Dieguez-Campo, Hanau, DE;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 23/02 (2006.01); C23C 14/24 (2006.01); C23C 14/12 (2006.01); C23C 14/22 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); C23C 14/12 (2013.01); C23C 14/225 (2013.01); C30B 23/02 (2013.01); H01L 51/001 (2013.01); H01L 51/0008 (2013.01); H01L 51/56 (2013.01);
Abstract

The present invention refers to a method as well as an apparatus for depositing a layer at a substrate, the layer containing at least two components co-deposited by at least two evaporation sources, wherein the mixture of the components regarding the content of the components is set by tilting the evaporation sources to predetermined angle and/or by positioning the evaporation sources at a predetermined distance with respect to the substrate and/or wherein evaporation plumes of the evaporation sources are arranged such that the maxima of the evaporation plumes are separated locally with respect to the substrate.


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