The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Aug. 11, 2009
Applicants:

Teruo Okano, Ichikawa, JP;

Masayuki Yamato, Tokyo, JP;

Tatsuya Shimizu, Hachioji, JP;

Masatoshi Kuroda, Kashiwa, JP;

Inventors:

Teruo Okano, Ichikawa, JP;

Masayuki Yamato, Tokyo, JP;

Tatsuya Shimizu, Hachioji, JP;

Masatoshi Kuroda, Kashiwa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12N 5/071 (2010.01); C12N 11/02 (2006.01); C12N 5/00 (2006.01);
U.S. Cl.
CPC ...
C12N 11/02 (2013.01); C12N 5/0062 (2013.01); C12N 2535/10 (2013.01); C12N 2539/10 (2013.01);
Abstract

This invention provides a cell pattern recovery tool comprising a base material layer having a surface subjected to easy adhesion treatment, a temperature responsive polymer layer that is provided on the base material layer and has a surface subjected to silane treatment, and a cell adhesion inhibiting material layer provided on the temperature responsive polymer layer. According to the present invention, a cell pattern can be rapidly recovered while maintaining the cell pattern stably and reliably under minimally invasive conditions for the cells.


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