The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Apr. 06, 2012
Applicants:
Zhigang Deng, Shanghai, CN;
Hai Yang, Shanghai, CN;
Liping Zheng, Shanghai, CN;
Su LU, Shanghai, CN;
Lin Chen, Shanghai, CN;
Hui Liu, Shanghai, CN;
Wei Cai, Shanghai, CN;
Xianguo Yu, Shanghai, CN;
Inventors:
Zhigang Deng, Shanghai, CN;
Hai Yang, Shanghai, CN;
Liping Zheng, Shanghai, CN;
Su Lu, Shanghai, CN;
Lin Chen, Shanghai, CN;
Hui Liu, Shanghai, CN;
Wei Cai, Shanghai, CN;
Xianguo Yu, Shanghai, CN;
Assignee:
General Electric Company, Niskayuna, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 12/28 (2006.01); C08F 20/00 (2006.01); C08F 26/02 (2006.01); B05D 5/12 (2006.01); H01B 1/00 (2006.01); C08F 220/58 (2006.01); C08F 2/10 (2006.01); C08F 220/38 (2006.01); H01M 8/10 (2006.01); H01G 11/48 (2013.01);
U.S. Cl.
CPC ...
C08F 220/58 (2013.01); C08F 2/10 (2013.01); C08F 220/38 (2013.01); H01G 11/48 (2013.01); H01M 8/1023 (2013.01); H01M 8/1072 (2013.01); Y10T 428/31725 (2015.04);
Abstract
A method is provided, comprising: copolymerizing a monomer comprising at least two amide groups, a monomer of formula (a) and a sulfonic acid or salt monomer, wherein Ris CHor H. A polymer made by the method, a membrane and an electrode comprising the polymer are provided.