The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Dec. 17, 2010
Applicants:

Diego Brita, Ferrara, IT;

Gianni Collina, Ferrara, IT;

Daniele Evangelisti, Ferrara, IT;

Anna Fait, Ferrara, IT;

Benedetta Gaddi, Ferrara, IT;

Giampiero Morini, Padua, IT;

Pietro Baita, S. Maria Maddalena, IT;

Lorella Marturano, Ferrara, IT;

Harry Mavridis, Lebanon, OH (US);

Inventors:

Diego Brita, Ferrara, IT;

Gianni Collina, Ferrara, IT;

Daniele Evangelisti, Ferrara, IT;

Anna Fait, Ferrara, IT;

Benedetta Gaddi, Ferrara, IT;

Giampiero Morini, Padua, IT;

Pietro Baita, S. Maria Maddalena, IT;

Lorella Marturano, Ferrara, IT;

Harry Mavridis, Lebanon, OH (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 4/76 (2006.01); C08F 4/646 (2006.01); C08F 4/649 (2006.01); C08F 110/02 (2006.01); C08F 10/00 (2006.01);
U.S. Cl.
CPC ...
C08F 10/00 (2013.01); C08F 110/02 (2013.01); C08F 2410/03 (2013.01);
Abstract

Catalyst component comprising Mg, Ti, and halogen atoms, and is characterized in that (a) the Ti atoms are present in an amount higher than 4% based on the total weight of the said catalyst component, (b) the amount of Mg and Ti atoms is such that the Mg/Ti molar ratio is higher than 2 and (c) by a X-ray diffraction spectrum, in which, in the range of 2θ diffraction angles between 47° and 52°, at least two diffraction lines are present at diffraction angles 2θ of 48.3±0.2°, and 50.0±0.2°, the most intense diffraction lines being the one at 2θ of 50.0±0.2°, the intensity of the other diffraction line being equal to or lower than the intensity of the most intense diffraction line.


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