The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
May. 23, 2012
Applicants:
Chenyu Wu, Mountain View, CA (US);
Jing Xiao, Cupertino, CA (US);
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/05 (2006.01); A61B 5/04 (2006.01);
U.S. Cl.
CPC ...
A61B 5/05 (2013.01); A61B 5/04007 (2013.01); A61B 5/04008 (2013.01); A61B 2576/023 (2013.01);
Abstract
A system identifies double-layer dipoles in a magnetic image by defining two-dimensional patches of distributed point charges that simulate the double-layer dipoles. The geometric center of a two-dimensional patch is used as the location of an equivalent dipole moment of the double-layer dipole. The momentum of the equivalent dipole moment is determined by submitting the magnetic image to a dipole construction system that identifies the location and momentum based on the submitted magnetic image.