The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
May. 17, 2010
Jonas Haunschild, Freiburg, DE;
Markus Glatthaar, Freiburg, DE;
Stefan Rein, Denzlingen, DE;
Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V., München, DE;
Albert-Ludwigs-Universität Freiburg, Freiburg, DE;
Abstract
A method for spatially determining the series resistance of a semiconductor structure by generating luminescent radiation in the semiconductor structure under measurement conditions A and B, by determining a local calibration parameter Cfor a plurality of prescribed locations of the semiconductor structure and determining local series resistances Rfor a plurality of prescribed locations of the semiconductor structure. It is essential that the local series resistances Rare each determined as a function of a global series resistance Rof the semiconductor structure that is identical for all local series resistances.