The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Nov. 25, 2013
Applicant:

Samsung Electronics Co., Ltd.;

Inventors:

Moon-Gi Cho, Suwon-si, KR;

Eun-Chul Ahn, Yongin-si, KR;

Sang-Young Kim, Cheonan-si, KR;

Joo-Weon Shin, Suwon-si, KR;

Min-Ho Lee, Cheonan-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/80 (2006.01); H01L 23/525 (2006.01); G06F 12/02 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5256 (2013.01); G06F 12/0246 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device has improved reliability by preventing a fuse cut through a repair process from being electrically reconnected by electrochemical migration. The semiconductor device includes a substrate, a fuse including a first fuse pattern and a second fuse pattern formed at the same level on the substrate, the first fuse pattern and the second fuse pattern being spaced a first width apart from each other such that a gap in the fuse is disposed at a first location between the first fuse pattern and the second fuse pattern, and a first insulation layer formed on the first fuse pattern and the second fuse pattern, the first insulation layer including an opening above the first location and having a second width smaller than the first width.


Find Patent Forward Citations

Loading…