The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Apr. 03, 2014
Applicant:

Sidense Corporation, Ottawa, CA;

Inventor:

Wlodek Kurjanowicz, Ottawa, CA;

Assignee:

Sidense Corporation, Ottawa, Ontario, CA;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/10 (2006.01); H01L 27/105 (2006.01); G11C 17/16 (2006.01); G11C 17/18 (2006.01); H01L 27/112 (2006.01); H01L 23/525 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1052 (2013.01); G11C 17/16 (2013.01); G11C 17/18 (2013.01); H01L 27/11206 (2013.01); H01L 23/5252 (2013.01);
Abstract

An anti-fuse memory cell having a variable thickness gate oxide. The variable thickness gate oxide is formed by depositing a first oxide over a channel region of the anti-fuse memory cell, removing the first oxide in a thin oxide area of the channel region, and then thermally growing a second oxide in the thin oxide area. The remaining first oxide defines a thick oxide area of the channel region. The second oxide growth occurs under the remaining first oxide, but at a rate less than thermal oxide growth in the thin oxide area. This results in a combined thickness of the first oxide and the second oxide in the thick oxide area being greater than second oxide in the thin oxide area.


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