The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Oct. 22, 2012
Applicant:

Fuji Electric Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takahiro Tamura, Matsumoto, JP;

Yasuhiko Onishi, Matsumoto, JP;

Mutsumi Kitamura, Matsumoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/08 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0878 (2013.01); H01L 29/0619 (2013.01); H01L 29/0634 (2013.01); H01L 29/7811 (2013.01); H01L 29/0638 (2013.01); H01L 29/0696 (2013.01); H01L 29/1095 (2013.01); H01L 29/404 (2013.01);
Abstract

A superjunction semiconductor device is disclosed in which the trade-off relationship between breakdown voltage characteristics and voltage drop characteristics is considerably improved, and it is possible to greatly improve the charge resistance of an element peripheral portion and long-term breakdown voltage reliability. It includes parallel pn layers of n-type drift regions and p-type partition regions in superjunction structure. PN layers are depleted when off-state voltage is applied. Repeating pitch of the second parallel pn layer in a ring-like element peripheral portion encircling the element active portion is smaller than repeating pitch of the first parallel pn layer in the element active portion. Element peripheral portion includes low concentration n-type region on the surface of the second parallel pn layer. The depth of p-type partition region of an outer peripheral portion in the element peripheral portion is smaller than the depth of p-type partition region of an inner peripheral portion.


Find Patent Forward Citations

Loading…