The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Oct. 06, 2014
Applicant:

Shimadzu Corporation, Kyoto-shi, Kyoto, JP;

Inventor:

Ryo Fujita, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/06 (2006.01); G01N 27/62 (2006.01); H01J 49/04 (2006.01);
U.S. Cl.
CPC ...
H01J 49/062 (2013.01); G01N 27/622 (2013.01); H01J 49/04 (2013.01);
Abstract

Shutter gate grid is a structure wherein first and second disc-shaped members made of metal with an insulation sheet member sandwiched therebetween are integrally joined by means of insulative screws. Gate grids with conductive wires secured to the central openings thereof are fused onto the disc-shaped members; screw insertion holes formed in the second disc-shaped member are fan-shaped and have play in the direction of rotation, making it possible to adjust the parallelism of the conductive wires of the two members by finely adjusting the rotational position when tightening the screws. Moreover, diffusion gas can be made to flow through ventilation holes provided at common locations on each member, thus making it possible to provide uniformity of diffusion gas flow in the drift region.


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