The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Sep. 12, 2012
Applicants:

Howell Hollis, Orlando, FL (US);

Sean Mcvey, Orlando, FL (US);

Zach Barth, Issaquah, WA (US);

Inventors:

Howell Hollis, Orlando, FL (US);

Sean McVey, Orlando, FL (US);

Zach Barth, Issaquah, WA (US);

Assignee:

Lockheed Martin Corporation, Bethesda, MD (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 15/00 (2011.01); G06T 17/00 (2006.01); G06T 17/05 (2011.01);
U.S. Cl.
CPC ...
G06T 17/05 (2013.01);
Abstract

A mechanism for concurrently generating a plurality of meshes is disclosed. A region of a simulated environment for a simulation is determined. An area that bounds the region is determined. The area is decomposed into a plurality of polygons. Data identifying a first elevation layer at locations in the region and a second elevation layer at the locations in the region is accessed. At least some of the polygons are processed based on a first elevation layer metric associated with the first elevation layer and a second elevation layer metric associated with the second elevation layer to concurrently generate a first mesh and a second mesh that include the at least some of the polygons.


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