The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Jan. 25, 2011
Jon Christopher Kennedy, Marlborough, MA (US);
Ronald Ray Trimble, Acton, MA (US);
Carey Jay Mcmaster, Stow, MA (US);
John Henry Petrangelo, Shrewsbury, MA (US);
Roland Leo Sorel, Westford, MA (US);
Patrick James Grinwald, Grafton, MA (US);
Jon Christopher Kennedy, Marlborough, MA (US);
Ronald Ray Trimble, Acton, MA (US);
Carey Jay McMaster, Stow, MA (US);
John Henry Petrangelo, Shrewsbury, MA (US);
Roland Leo Sorel, Westford, MA (US);
Patrick James Grinwald, Grafton, MA (US);
Sepaton, Inc., Marlborough, MA (US);
Abstract
Described are computer-based methods and apparatuses, including computer program products, for detection and deduplication of backup sets exhibiting poor locality. A first set of summaries of a first data set are determined, each summary of the first set of summaries being indicative of a data pattern in the first data set. A second set of summaries of a second data set are determined, each summary of the second set of summaries being indicative of a data pattern in the second data set. A set of comparison metrics are calculated, each comparison metric being based on a first subset of summaries from the first set of summaries and a second subset of summaries from the second set of summaries. A locality metric is calculated based on the set of comparison metrics indicative of whether the first data set and second data set exhibit poor locality.