The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
May. 30, 2012
Michinobu Mizumura, Yokohama, JP;
Kazushige Hashimoto, Yokohama, JP;
Makoto Hatanaka, Yokohama, JP;
V TECHNOLOGY CO., LTD., Yokohama-shi, JP;
Abstract
Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomasks so that same-size erect images of mask patterns formed on the photomasks can be formed on the surface of the TFT substrate are arranged in a plane parallel with the photomasks and the surface of the TFT substrate held on the stage, and moving device that moves the lens assemblies in a plane parallel with the masks and the surface of TFT substrate held on the stage.