The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Jan. 24, 2014
Applicant:

Mitsubishi Shindoh Co., Ltd., Tokyo, JP;

Inventors:

Keiichiro Oishi, Osaka, JP;

Kouichi Suzaki, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22F 1/08 (2006.01); C22C 21/10 (2006.01); B21B 1/22 (2006.01); B21B 3/00 (2006.01); C22C 9/04 (2006.01); C22F 1/00 (2006.01); H01B 1/02 (2006.01); C22C 9/02 (2006.01); C21D 11/00 (2006.01); C22C 13/00 (2006.01);
U.S. Cl.
CPC ...
C22C 21/10 (2013.01); B21B 1/22 (2013.01); B21B 3/00 (2013.01); C22C 9/04 (2013.01); C22F 1/00 (2013.01); C22F 1/08 (2013.01); H01B 1/026 (2013.01); C22C 13/00 (2013.01);
Abstract

An aspect of the copper alloy sheet contains 5.0 mass % to 12.0 mass % of Zn, 1.1 mass % to 2.5 mass % of Sn, 0.01 mass % to 0.09 mass % of P and 0.6 mass % to 1.5 mass % of Ni with a remainder of Cu and inevitable impurities, and satisfies a relationship of 20≦[Zn]+7×[Sn]+15×[P]+4.5×[Ni]≦32. The aspect of the copper alloy sheet is manufactured using a manufacturing process including a cold finishing rolling process in which a copper alloy material is cold-rolled, the average crystal grain diameter of the copper alloy material is 1.2 μm to 5.0 μm, round or oval precipitates are present in the copper alloy material, the average grain diameter of the precipitates is 4.0 nm to 25.0 nm or a proportion of precipitates having a grain diameter of 4.0 nm to 25.0 nm in the precipitates is 70 % or more.


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