The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Oct. 30, 2009
Zhaoqing Liu, Shanghai, CN;
Floryan DE Campo, Shanghai, CN;
Zhaoqing Liu, Shanghai, CN;
Floryan De Campo, Shanghai, CN;
SOLVAY CHINA CO., LTD., Shanghai, CN;
Abstract
This invention relates to new monomers prepared from phosphorus-containing diene monomers and (meth)acrylonitrile via Ritter reactions, and the preparation method thereof. The polymer of these monomers can be utilized in various applications such as water treatment, rheology modifier, surface modification, etc. The monomers have the following structure (II), Wherein R, R, R, R, R, Rand Rrepresent, independently, hydrogen, alkyl, aryl, alkaryl, aralkyl, cycloalkyl, heterocycloalkyl, or alkenyl groups; Rand Rrepresents RO, and Rrespectively wherein Rand Rrepresents hydrogen, alkyl, aryl, alkaryl, aralkyl, cycloalkyl, alkenyl groups, or metals selected from the group consisting of Na, Li, Ca; Rrepresents H, or CH.