The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Apr. 13, 2012
Hyungryul Choi, Cambridge, MA (US);
Chih-hao Chang, Cambridge, MA (US);
Kyoo Chul Park, Cambridge, MA (US);
Gareth H Mckinley, Acton, MA (US);
George Barbastathis, Boston, MA (US);
Jeong-gil Kim, Cambridge, MA (US);
Hyungryul Choi, Cambridge, MA (US);
Chih-Hao Chang, Cambridge, MA (US);
Kyoo Chul Park, Cambridge, MA (US);
Gareth H McKinley, Acton, MA (US);
George Barbastathis, Boston, MA (US);
Jeong-gil Kim, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile