The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Feb. 07, 2013
Applicants:

Christopher John Ellison, Austin, TX (US);

Carlton Grant Willson, Austin, TX (US);

Julia Cushen, Austin, TX (US);

Christopher M. Bates, Austin, TX (US);

Inventors:

Christopher John Ellison, Austin, TX (US);

Carlton Grant Willson, Austin, TX (US);

Julia Cushen, Austin, TX (US);

Christopher M. Bates, Austin, TX (US);

Attorney:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); B05D 3/00 (2006.01); B05D 5/00 (2006.01); B05C 21/00 (2006.01); C08G 63/695 (2006.01); C08F 112/14 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B05C 21/005 (2013.01); B05D 1/005 (2013.01); B05D 3/00 (2013.01); B05D 5/00 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 112/14 (2013.01); C08G 63/6952 (2013.01); G03F 7/0002 (2013.01); C08F 2810/40 (2013.01); Y10T 428/24851 (2015.01); Y10T 428/31504 (2015.04);
Abstract

A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening polymerization reactions. This block copolymer may form nanoporous materials that can be used as etch masks in lithographic patterning.


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