The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Jun. 05, 2009
Applicants:
Walter Riley Buchanan, Overland Park, KS (US);
Christopher Daniel Hruska, Blue Springs, MO (US);
Inventors:
Walter Riley Buchanan, Overland Park, KS (US);
Christopher Daniel Hruska, Blue Springs, MO (US);
Assignee:
EON LABS, LLC, Kansas City, KS (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); B01J 12/00 (2006.01); B01J 19/00 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
B01J 19/0093 (2013.01); B01J 19/088 (2013.01); H05H 1/24 (2013.01); B01J 2219/00783 (2013.01); B01J 2219/00824 (2013.01); B01J 2219/00826 (2013.01); B01J 2219/00828 (2013.01); B01J 2219/00831 (2013.01); B01J 2219/00853 (2013.01); B01J 2219/00869 (2013.01); B01J 2219/0809 (2013.01); B01J 2219/0815 (2013.01); B01J 2219/0835 (2013.01); B01J 2219/0843 (2013.01); B01J 2219/0847 (2013.01); B01J 2219/0892 (2013.01); H05H 2245/121 (2013.01);
Abstract
A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.