The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
Oct. 12, 2011
Koji Miyata, Kanagawa, JP;
Koji Miyata, Kanagawa, JP;
SONY CORPORATION, Tokyo, JP;
Abstract
A manufacturing method of a memory apparatus in which memory devices each having a memory layer whose resistance value reversibly varies by voltage application between bottom and upper electrodes are formed, includes: forming and shaping a bottom electrode material film into a first linear pattern extending in a first direction; forming a memory layer material film and an upper electrode material film in this order on the bottom electrode material film; forming the upper electrodes and the memory layers by shaping the upper electrode material film and the memory layer material film into a second linear pattern extending in a second direction intersecting with the first direction; and forming the bottom electrodes having a quadrangle plane shape at regions where the first linear pattern intersect with the second linear pattern by shaping the bottom electrode material film into the second linear pattern.