The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Mar. 05, 2013
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventor:

Satoshi Inoue, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/34 (2006.01); G11C 16/04 (2006.01); H01L 29/788 (2006.01); H01L 29/66 (2006.01); H01L 27/115 (2006.01); G11C 29/50 (2006.01); H01L 23/525 (2006.01); G11C 29/04 (2006.01);
U.S. Cl.
CPC ...
G11C 16/0408 (2013.01); G11C 29/50004 (2013.01); H01L 27/11524 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01); H01L 29/7881 (2013.01); G11C 2029/0403 (2013.01); H01L 23/5252 (2013.01);
Abstract

According to one embodiment, a nonvolatile semiconductor memory device includes a memory cell and a select gate transistor formed on a semiconductor substrate. The memory cell includes a first gate insulating film, a first charge storage layer, a first intergate insulating film, and a first control gate. The first gate insulating film, the first charge storage layer, the first intergate insulating film, and the first control gate are formed on the semiconductor substrate in order. The select gate transistor includes a second gate insulating film, a first gate electrode, a second intergate insulating film, and a second control gate. The second gate insulating film, the first gate electrode, the second intergate insulating film, and the second control gate are formed on the semiconductor substrate in order. The second intergate insulating film different first and second thicknesses.


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