The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
Oct. 14, 2011
Younghoon Shin, Hwaseong-Si, KR;
Kunsoo Kim, Suwon-Si, KR;
Namyeol Yang, Osan-Si, KR;
LG Electronics Inc., Seoul, KR;
Abstract
The present invention relates to a maskless exposure apparatus and a maskless exposure method which increase resolution of an exposure pattern and enhance efficiency of an optical system by using a phase shifter. More specifically, according to one aspect of the present invention, the maskless exposure apparatus includes: a lighting unit for outputting predetermined light; a spatial light modulator (SLM) for receiving the light from the lighting unit and outputting a light having a predetermined pattern; a beam expander for expanding the light outputted from the spatial light modulator; a micro lens array (MLA) for dividing the light expanded from the beam expander into a plurality of lights and collecting the lights; and a projection lens for adjusting the resolution of the lights collected through the micro lens array and project the adjusted lights into a target, a spatial filter having a phase shifter pattern being positioned between the micro lens array and the projection lens.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile