Manufacturing method of light barrier glass sheet

Abstract

A manufacturing method of a light barrier glass sheet, comprising: farming a metal layer () on a glass substrate (); coating a first photoresist layer () on the metal layer (), performing first exposure on the first photoresist layer () through a half tone mask, then performing first development on the first photoresist layer (); removing partial region of the metal layer () through a first etching process; removing a partial thickness and a partial region of the first photoresist layer () through an ashing process; forming an insulating layer () on the exposed glass substrate (), the exposed metal layer (), the first photoresist layer () after the ashing process, and sidewalls of the photoresist layer () after the ashing process; removing the first photoresist layer (), the insulating layer () on the first photoresist layer (), and the insulating layer () on the sidewalls of the first photoresist layer () by a photoresist lifting-off process so as to form a via hole (); forming a transparent pixel electrode pattern () in the via hole (), on sidewalls of the via hole () and on the insulating layer (). With the method, one mask process can be omitted, thus the manufacturing process can be simplified, the production efficiency can be improved and the production cost can be reduced.