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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9115977 B1

PDFFull Text
Date of Patent:
Aug. 25, 2015

Filed:

Jul. 20, 2012

Near-null compensator and figure metrology apparatus for measuring aspheric surfaces by subaperture stitching and measuring method thereof

Applicants:

Shanyong Chen, Changsha, CN;

Yifan Dai, Changsha, CN;

Shengyi LI, Changsha, CN;

Xiaoqiang Peng, Changsha, CN;

Chao Xie, Changsha, CN;

Yanglin Peng, Changsha, CN;

Inventors:

Shanyong Chen, Changsha, CN;

Yifan Dai, Changsha, CN;

Shengyi Li, Changsha, CN;

Xiaoqiang Peng, Changsha, CN;

Chao Xie, Changsha, CN;

Yanglin Peng, Changsha, CN;

Assignee:

NATIONAL UNIVERSITY OF DEFENSE TECHNOLOGY, Changsha, Hunan, CN;

Attorneys:

Raymond Y. Chan

David and Raymond Patent Firm

Primary Examiner:

Jonathan Hansen

Int. Cl.
CPC ...
G01B 9/021 (2006.01); G01M 5/00 (2006.01); G01M 11/02 (2006.01); G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
G01B 9/021 (2013.01); G01B 9/02039 (2013.01); G01B 9/02058 (2013.01); G01B 9/02085 (2013.01); G01M 5/005 (2013.01); G01M 11/025 (2013.01); G01M 11/0271 (2013.01);
Abstract

A variable near-null compensator for measuring aspheric surfaces by subaperture stitching includes a pair of counter-rotating CGH phase plates, each of the phase plates having a phase function including two terms Z5 and Z7 of Zernike polynomials. The phase plates are mounted on a pair of precision rotary center-through tables, wherein rotational axes of the pair of precision rotary center-through tables coincide with the optical axes of the phase plates. A figure metrology apparatus includes a wavefront interferometer, the test mirror mount, the near-null compensator and the mechanical adjustment components therefor. The optical axis of the near-null compensator coincides with the optical axis of the interferometer. A method for measuring aspheric surfaces by subaperture stitching includes the steps of mounting the test mirror, measuring the subapertures with the figure metrology apparatus, and finally processing the data by stitching.

Find Patent Forward Citations

Chen, Shanyong. (2015). Near-null compensator and figure metrology apparatus for measuring aspheric surfaces by subaperture stitching and measuring method thereof (U.S. Patent No. 9115977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9115977

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