The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
Jul. 12, 2012
Nana Takeuchi, Otsu, JP;
Seiji Fukuda, Otsu, JP;
Ryoji Okuda, Otsu, JP;
Shigetaka Kasai, Urayasu, JP;
Nana Takeuchi, Otsu, JP;
Seiji Fukuda, Otsu, JP;
Ryoji Okuda, Otsu, JP;
Shigetaka Kasai, Urayasu, JP;
TORAY INDUSTRIES, INC., Tokyo, JP;
Abstract
A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 90 degrees, the angle β is not smaller than 85 degrees, and the angle β is smaller than the angle α, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3×10μm/Pa and not more than 4.4×10μm/Pa.