The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
Sep. 24, 2009
Georges Zagdoun, La Garenne Colombes, FR;
Bernard Nghiem, Arsy, FR;
Emmanuel Valentin, Le Plessis Trevise, FR;
Svetoslav Tchakarov, Sceaux, FR;
Georges Zagdoun, La Garenne Colombes, FR;
Bernard Nghiem, Arsy, FR;
Emmanuel Valentin, Le Plessis Trevise, FR;
Svetoslav Tchakarov, Sceaux, FR;
SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;
Abstract
A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a solution of colloidal nanoparticles that are stabilized and dispersed in a first solvent is deposited, the particles having a given glass transition temperature T, the drying of the masking layer is carried out at a temperature below the temperature Tuntil a mask having a two-dimensional network of submillimetric openings is obtained with substantially straight mask area edges, in a zone referred to as a network mask zone, a zone free of masking is formed on the face by mechanical and/or optical removal of at least one peripheral portion of the network mask zone. The invention also relates to the network mask and the grid with an electroconductive solid zone that are thus obtained.