The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
May. 09, 2014
Saga University, Saga, JP;
Tatsuya Misawa, Saga, JP;
Nobuya Hayashi, Saga, JP;
SAGA University, Saga, JP;
Abstract
There is provided a plasma generation device capable of suppressing arc discharge in which discharge is localized to cause a high temperature, and allowing atmospheric discharge plasma to be stably generated with a high generation efficiency in a low temperature at about a room temperature without being spatially biased. The plasma generation device arranged with a plurality of electrodes facing each other includes a discharge position control unit, which is arranged between each of the plurality of electrodes, and is formed by containing an inverse characteristic material composed of a fluid having polarizability and a property that dielectric constant decreases with an increase in temperature, in a container formed of a dielectric material, wherein the inverse characteristic material is spaced apart from each of the plurality of electrodes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile