The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Feb. 11, 2011
Applicants:

Daniele Bresciani, Toulouse, FR;

Hervé Legay, Plaisance du Touch, FR;

Gérard Caille, Tournefeuille, FR;

Eric Labiole, Villeneuve Tolosane, FR;

Inventors:

Daniele Bresciani, Toulouse, FR;

Hervé Legay, Plaisance du Touch, FR;

Gérard Caille, Tournefeuille, FR;

Eric Labiole, Villeneuve Tolosane, FR;

Assignee:

THALES, Courbevoie, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 19/10 (2006.01); H01Q 15/24 (2006.01); H01Q 15/00 (2006.01); H01Q 15/12 (2006.01); H01Q 3/46 (2006.01); H01Q 15/14 (2006.01);
U.S. Cl.
CPC ...
H01Q 19/10 (2013.01); H01Q 3/46 (2013.01); H01Q 15/00 (2013.01); H01Q 15/006 (2013.01); H01Q 15/12 (2013.01); H01Q 15/141 (2013.01); H01Q 15/24 (2013.01); Y10T 29/49016 (2015.01);
Abstract

A reflector array antenna with cross-polarization compensation including at least one radiating element having an etched pattern dissymmetric with respect to at least one direction X and/or Y of the plane XY of the radiating element, the dissymmetry of the pattern of the radiating element being calculated individually on the basis of a radiating element of the same symmetric pattern along the two directions X and Y, so as to engender a reflected wave having a controlled depolarization which opposes a depolarization, engendered in a plane normal to a direction of propagation, by the reflector array illuminated by a primary source.


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