The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9112131 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 18, 2015

Filed:

Dec. 13, 2013
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventors:

Yoshiaki Saito, Kawasaki, JP;

Hideyuki Sugiyama, Kawasaki, JP;

Tomoaki Inokuchi, Kawasaki, JP;

Takao Marukame, Tokyo, JP;

Mizue Ishikawa, Yokohama, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/118 (2006.01); H01L 43/02 (2006.01); G11C 11/16 (2006.01); H01L 43/10 (2006.01); B01D 53/14 (2006.01); B01D 53/62 (2006.01);
U.S. Cl.
CPC ...
H01L 43/02 (2013.01); G11C 11/16 (2013.01); H01L 43/10 (2013.01); B01D 53/1493 (2013.01); B01D 53/62 (2013.01);
Abstract

A spin MOSFET includes a first ferromagnetic layer having a fixed magnetization direction, a first tunnel barrier, a second ferromagnetic layer having a variable magnetization direction, and a nonmagnetic semiconductor layer provided in that order on a substrate. The nonmagnetic semiconductor layer has lower and upper faces and a side faces serving as a channel. A third ferromagnetic layer having a fixed magnetization direction is provided on the upper face of the nonmagnetic semiconductor layer, wherein the magnetization direction of each of the first to third ferromagnetic layers is in parallel or antiparallel to a direction from the third ferromagnetic layer to the first ferromagnetic layer. A nonmagnetic layer is provided on the third ferromagnetic layer, and a gate insulating film and gate electrode are provided in that order on the side face of the nonmagnetic semiconductor layer.


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