The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Apr. 19, 2013
The Royal Institution for the Advancement of Learning / Mcgill University, Montreal, CA;
Zetian Mi, Verdun, CA;
Md Golam Kibria, Montreal, CA;
Abstract
Metal-nitride nanowires are amongst the candidates for very high efficiency electronics, solid state light sources, photovoltaics, photoelectrochemical devices, and photobiological devices. Enhanced performance typically requires heterostructures, quantum dots, etc within structures that are grown with relatively few defects and in a controllable reproducible manner. Additionally device design flexibility requires that the nanowire at the substrate be either InN or GaN. Methods of growing relatively defect free nanowires and associated structures for group IIIA-nitrides are presented without foreign metal catalysts thereby overcoming the non-uniform growth of prior art techniques and allowing self-organizing quantum dot, quantum well and quantum dot-in-a-dot structures to be formed, thereby supporting variety of high efficiency devices.