The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Feb. 13, 2012
Applicants:

Mary Elizabeth Sullivan-malervy, Downingtown, PA (US);

Robert Daniel Hilty, Harrisburg, PA (US);

Rodney I. Martens, Mechanicsburg, PA (US);

Min Zheng, Harrisburg, PA (US);

Jessica Henderson Brown Hemond, Mifflintown, PA (US);

Zhengwei Liu, Herhsey, PA (US);

Inventors:

Mary Elizabeth Sullivan-Malervy, Downingtown, PA (US);

Robert Daniel Hilty, Harrisburg, PA (US);

Rodney I. Martens, Mechanicsburg, PA (US);

Min Zheng, Harrisburg, PA (US);

Jessica Henderson Brown Hemond, Mifflintown, PA (US);

Zhengwei Liu, Herhsey, PA (US);

Assignee:

TYCO ELECTRONICS CORPORATION, Berwyn, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/09 (2006.01); H01L 21/768 (2006.01); B82Y 30/00 (2011.01); C23C 16/02 (2006.01); C23C 16/26 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7685 (2013.01); B82Y 30/00 (2013.01); C23C 16/0272 (2013.01); C23C 16/26 (2013.01); H01L 23/53238 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A method of manufacturing an electrical conductor includes providing a substrate layer, depositing a surface layer on the substrate layer that has pores at least partially exposing the substrate layer, and forming graphene deposits in the pores. Optionally, the graphene deposits may be formed only in the pores. The graphene deposits may be formed along the exposed portions of the substrate layer. The graphene layers may be selectively deposited or may be deposited to cover an entire layer. Optionally, the forming of the graphene deposits may include processing the electrical conductor using a chemical vapor deposition process using an organic compound precursor and heat of sufficient temperature to facilitate graphene growth on the metal compound comprising the substrate layer.


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