The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Aug. 28, 2012
Akiko Kakutani, Yokohama, JP;
Kiyoshi Hashimoto, Yokohama, JP;
Kiyokazu Sato, Meguro-Ku, JP;
Akihiro Osanai, Yokohama, JP;
Takeshi Yoshiyuki, Yokohama, JP;
Tsutomu Kurusu, Meguro-Ku, JP;
Kazuo Hayashi, Yokohama, JP;
Akiko Kakutani, Yokohama, JP;
Kiyoshi Hashimoto, Yokohama, JP;
Kiyokazu Sato, Meguro-Ku, JP;
Akihiro Osanai, Yokohama, JP;
Takeshi Yoshiyuki, Yokohama, JP;
Tsutomu Kurusu, Meguro-Ku, JP;
Kazuo Hayashi, Yokohama, JP;
KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;
Abstract
Provide an ion source for outputting ion beam with high purity of polyvalent positive ion. The ion sourceincludes: a targetfrom which electron and positive ion are generated by plasma formed by laserirradiation; a first power supply source (first voltage E) that sets an electric potential of the targethigher than that of a destination of the positive ion (corresponding to an acceleration channelin FIG.); and a second power supply source (second voltage E) that sets an electric potential of on a pass (corresponding to a filter electrodein FIG.) from the targetto the destinationhigher than that of the target