The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Jun. 12, 2007
Applicants:

Peter Zink, Aachen, DE;

Christof Metzmacher, La Calamine, BE;

Rolf Theo Anton Apetz, Aachen, DE;

Inventors:

Peter Zink, Aachen, DE;

Christof Metzmacher, La Calamine, BE;

Rolf Theo Anton Apetz, Aachen, DE;

Assignee:

KONINKLIJKE PHILPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/52 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); G21K 1/06 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); B82Y 10/00 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); G21K 1/06 (2013.01); C23C 14/3492 (2013.01);
Abstract

A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.


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