The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Dec. 20, 2010
Applicants:

Douglas J. Guerrero, Rolla, MO (US);

Robert Christian Cox, Rolla, MO (US);

Marc W. Weimer, Rolla, MO (US);

Inventors:

Douglas J. Guerrero, Rolla, MO (US);

Robert Christian Cox, Rolla, MO (US);

Marc W. Weimer, Rolla, MO (US);

Assignee:

Brewer Science Inc., Rolla, MO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 7/40 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); C07C 43/166 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C07C 43/166 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/40 (2013.01); G03F 7/094 (2013.01); Y10S 438/952 (2013.01);
Abstract

Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).


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