The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Sep. 21, 2012
Applicants:
Ming-hau Tung, San Francisco, CA (US);
Srinivasan Kodaganallur Ganapathi, Palo Alto, CA (US);
Inventors:
Ming-Hau Tung, San Francisco, CA (US);
Srinivasan Kodaganallur Ganapathi, Palo Alto, CA (US);
Assignee:
QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02F 1/19 (2006.01); G06F 15/00 (2006.01); G02B 5/08 (2006.01); G06F 3/044 (2006.01);
U.S. Cl.
CPC ...
G02B 26/001 (2013.01); G02B 5/08 (2013.01); G02F 1/19 (2013.01); G06F 3/044 (2013.01); G06F 15/00 (2013.01);
Abstract
This disclosure provides systems, methods and apparatus for masked reflective structures which can be integrated into display devices. In one aspect, masks and etch leading layers can be used to control the etching of a stack of layers to form masked reflective structures having a desired profile. In particular, tapered edges at a particular angle can be formed, and the resulting structures used in a roll-to-roll process to fabricate a device component.