The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Jul. 21, 2010
Applicants:

Klaus Feisst, Stegen, DE;

Eric Bergmann, Steinen, DE;

Inventors:

Klaus Feisst, Stegen, DE;

Eric Bergmann, Steinen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 13/88 (2006.01); G01F 23/284 (2006.01); G01S 7/03 (2006.01); H01Q 1/00 (2006.01); H01Q 1/22 (2006.01); H01Q 13/02 (2006.01); H01Q 13/24 (2006.01);
U.S. Cl.
CPC ...
G01S 13/88 (2013.01); G01F 23/284 (2013.01); G01S 7/032 (2013.01); H01Q 1/002 (2013.01); H01Q 1/225 (2013.01); H01Q 13/02 (2013.01); H01Q 13/24 (2013.01);
Abstract

An apparatus forming a measuring device for ascertaining and monitoring a chemical or physical process variable in a high temperature process in a container, wherein the measuring device is formed from at least a sensor element located in the process and at least a measurement transmitter located outside the process. At least a first sealing element is provided for sealing against penetration of process medium into the sensor element. The sensor element has a boundary location between a first sensor element region, which faces the process and which is embodied with a high thermal resistance, and a second sensor element region, which faces away from the process and which has a low thermal resistance, and that the temperature sensitive element is arranged in the sensor element at the boundary location.


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