The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Jul. 07, 2010
Atsushi Yasuda, Yokohama, JP;
Tomoya Oshikiri, Yokohama, JP;
Daisuke Matsumoto, Yokohama, JP;
Keisuke Katou, Yokohama, JP;
Shinichi Maeda, Yokohama, JP;
Atsushi Yasuda, Yokohama, JP;
Tomoya Oshikiri, Yokohama, JP;
Daisuke Matsumoto, Yokohama, JP;
Keisuke Katou, Yokohama, JP;
Shinichi Maeda, Yokohama, JP;
Mitsubishi Rayon, Co., Ltd., Tokyo, JP;
Abstract
A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.