The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Mar. 08, 2011
Applicants:

Kenichiro Nakamatsu, Osaka, JP;

Hidekazu Hayashi, Osaka, JP;

Kiyoshi Minoura, Osaka, JP;

Akinobu Isurugi, Osaka, JP;

Inventors:

Kenichiro Nakamatsu, Osaka, JP;

Hidekazu Hayashi, Osaka, JP;

Kiyoshi Minoura, Osaka, JP;

Akinobu Isurugi, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 33/42 (2006.01); C25D 11/12 (2006.01); G02B 1/11 (2006.01); B29C 45/37 (2006.01); C25D 11/18 (2006.01); G02B 1/118 (2015.01); C25D 11/16 (2006.01); B29C 33/56 (2006.01); C25D 11/04 (2006.01);
U.S. Cl.
CPC ...
B29C 45/372 (2013.01); B29C 33/565 (2013.01); C25D 11/045 (2013.01); C25D 11/12 (2013.01); C25D 11/16 (2013.01); C25D 11/18 (2013.01); G02B 1/118 (2013.01); B29C 33/424 (2013.01);
Abstract

An anodized layer formation method of an embodiment of the present invention includes the step a of providing an aluminum film which is formed on a first principal surface of a support and the step b of anodizing a surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions. In the step a, a second principal surface of the support which is opposite to the first principal surface is provided with a low heat conduction member that has a predetermined pattern. According to an embodiment of the present invention, a porous alumina layer can be formed which includes regions of different minute structures in the predetermined pattern.


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