The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Jul. 19, 2011
Applicants:

Hideki Shimoi, Hamamatsu, JP;

Keisuke Araki, Hamamatsu, JP;

Inventors:

Hideki Shimoi, Hamamatsu, JP;

Keisuke Araki, Hamamatsu, JP;

Assignee:

HAMAMATSU PHOTONICS K. K., Hamamatsu-shi, Shizuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); B23K 26/00 (2014.01); B23K 26/36 (2014.01); H01L 31/0236 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0084 (2013.01); B23K 26/365 (2013.01); H01L 31/02363 (2013.01); Y02E 10/50 (2013.01);
Abstract

A method for manufacturing a light-absorbing substrate having a surface with depressions and projections comprises a first step of irradiating a substrate with a laser light so as to form a plurality of modified regions arranged two-dimensionally along a surface of the substrate within the substrate and cause at least one of each modified region and a fracture generated from the modified region to reach the surface of the substrate and a second step of etching the surface of the substrate after the first step so as to form depressions and projections on the surface of the substrate.


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