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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9108166 B1

PDFFull Text
Date of Patent:
Aug. 18, 2015

Filed:

Jul. 14, 2011

Silica membrane and method for manufacturing the same

Applicants:

Naoko Takahashi, Nagoya, JP;

Kouta Asai, Nagoya, JP;

Inventors:

Naoko Takahashi, Nagoya, JP;

Kouta Asai, Nagoya, JP;

Assignee:

NGK Insulators, Ltd., Nagoya, JP;

Attorney:

Burr & Brown, PLLC

Primary Examiner:

David C Mellon

Assistant Examiner:

Pranav Patel

Int. Cl.
CPC ...
B01D 71/02 (2006.01); B01D 53/22 (2006.01); B01D 61/36 (2006.01); B01D 63/06 (2006.01); B01D 69/02 (2006.01); B01D 67/00 (2006.01);
U.S. Cl.
CPC ...
B01D 71/027 (2013.01); B01D 53/228 (2013.01); B01D 61/362 (2013.01); B01D 63/066 (2013.01); B01D 67/0048 (2013.01); B01D 69/02 (2013.01); B01D 67/0039 (2013.01); B01D 67/0081 (2013.01); B01D 71/02 (2013.01); B01D 2323/08 (2013.01); B01D 2323/12 (2013.01); B01D 2323/42 (2013.01); B01D 2325/28 (2013.01);
Abstract

There is provided a silica membraneformed on a porous substrate. A desorbed ionic strength of water having a temperature of 500° C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g. The silica membraneis manufactured by allowing a silica sol having a water concentration of 0.03 to 3 mass % to adhere to a porous substrate by an ethanol solvent, drying the silica sol by sending air having a dew point of −70 to 0° C., and firing the dried silica sol at 200 to 400° C.

Find Patent Forward Citations

Takahashi, Naoko. (2015). Silica membrane and method for manufacturing the same (U.S. Patent No. 9108166). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9108166

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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