The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Sep. 11, 2014
Applicant:

Agilent Technologies, Inc., Santa Clara, CA (US);

Inventors:

Trygve Ristroph, Santa Clara, CA (US);

Mark Denning, Santa Clara, CA (US);

Kenneth R. Newton, Santa Clara, CA (US);

Guthrie Partridge, Santa Clara, CA (US);

Assignee:

Agilent Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 49/10 (2006.01); H01J 49/26 (2006.01);
U.S. Cl.
CPC ...
H01J 49/0054 (2013.01); H01J 49/0031 (2013.01); H01J 49/10 (2013.01); H01J 49/26 (2013.01);
Abstract

An electron capture dissociation (ECD) apparatus includes a plasma source for generating plasma. Analyte ions are exposed to the plasma in an ECD interaction region, either inside or outside the plasma source. The apparatus may include one or more devices for refining the plasma in preparation for interaction with the analyte ions. Refining may entail removing unwanted species from the plasma, such as photons, metastable particles, neutral particles, and/or high-energy electrons unsuitable for ECD, and/or controlling a density of low-energy electrons in the plasma.


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