The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Jan. 19, 2011
Applicants:
Hiroyuki Makino, Kanagawa, JP;
Masaru Tanaka, Kanagawa, JP;
Inventors:
Hiroyuki Makino, Kanagawa, JP;
Masaru Tanaka, Kanagawa, JP;
Assignee:
SUMITOMO HEAVY INDUSTRIES, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01); C25F 1/00 (2006.01); C25F 3/30 (2006.01); C25F 5/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/3244 (2013.01); H01J 37/32412 (2013.01); H01J 37/32422 (2013.01); H01J 37/32706 (2013.01);
Abstract
A plasma processing apparatus performs generating plasma only with the carrier gas without the supply of the processing gas after the end of processing to the substrate.