The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Oct. 10, 2012
Applicant:

Empire Technology Development Llc, Wilmington, DE (US);

Inventor:

Thomas A. Yager, Encinitas, CA (US);

Assignee:

Empire Technology Development LLC, Wilmington, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/95 (2006.01); H01L 29/16 (2006.01); G01N 21/84 (2006.01);
U.S. Cl.
CPC ...
G01N 21/95 (2013.01); G01N 21/8422 (2013.01); H01L 29/1606 (2013.01); G01N 21/9501 (2013.01);
Abstract

Technologies are generally described for identifying defects in saturable absorbers, such as graphene, by the saturable property of decreasing light absorbance with increasing light intensity. For example, a graphene coated substrate may be imaged twice under two distinct incident intensities. At a gap in the graphene, the substrate may reflect light proportional to the incident intensities. The graphene may show a non-linear increase in reflected light as the intensity of illumination increases. A difference between the two incident intensities may reveal the gap in the graphene. Any suitable imaging technique may be employed such as confocal microscopy or linear scanning. The imaging may be scaled up for high volume automated inspection.


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