The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Feb. 16, 2011
Applicants:

Michihiro Andoh, Hyogo, JP;

Shuichi Yadori, Hyogo, JP;

Inventors:

Michihiro Andoh, Hyogo, JP;

Shuichi Yadori, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 3/00 (2006.01); C03B 5/24 (2006.01); G01N 21/85 (2006.01);
U.S. Cl.
CPC ...
G01N 21/85 (2013.01); C03B 3/00 (2013.01); C03B 5/245 (2013.01);
Abstract

Method for monitoring molten state of a glass batch charged into a melting bath of a glass melting furnace, and a method and control device for controlling an amount of a glass batch to be so charged. Regions to be measured are set in regions corresponding to particular partial regions on an image obtained by capturing an image of a liquid surface of the bath to be monitored using a camera. The occupying ratio of an area occupied by image portions representing unmolten glass batches in each region, and a distribution state of the batches in the partial region is recognized from the measured value of the occupying ratios so as to determine whether the molten state quality of the batch is favorable. When the determined quality is not favorable, the amounts thereof to be charged by batch chargers are controlled so that appropriate distribution states can be obtained.


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