The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Jul. 14, 2011
Applicants:
Eric Grenet, Neuchatel, CH;
Peter Masa, Onnens, CH;
Edoardo Franzi, Yverdon-les-Bains, CH;
David Hasler, Neuchatel, CH;
Inventors:
Eric Grenet, Neuchatel, CH;
Peter Masa, Onnens, CH;
Edoardo Franzi, Yverdon-les-Bains, CH;
David Hasler, Neuchatel, CH;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G01C 3/08 (2006.01); G01D 5/34 (2006.01); G01D 5/38 (2006.01); G01S 1/70 (2006.01); G01S 3/781 (2006.01); G01S 3/783 (2006.01);
U.S. Cl.
CPC ...
G01B 11/14 (2013.01); G01C 3/085 (2013.01); G01D 5/34 (2013.01); G01D 5/38 (2013.01); G01S 1/70 (2013.01); G01S 3/781 (2013.01); G01S 3/7835 (2013.01);
Abstract
A system measures the position of a light source in space using an imager and transparent surface with a pattern on top. The pattern consists of a repetitive pattern and a distinctive element. The system achieves sub-micron precision. It also handles the measurement of several light sources simultaneously, and the measurement of the position of a retroreflector instead of the light.