The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Oct. 20, 2011
Applicants:
Randy Dorn, San Jose, CA (US);
Jason Cheng, Cupertino, CA (US);
Hyung Paek, San Mateo, CA (US);
Inventors:
Assignee:
APOLLO PRECISION BEIJING LIMITED, Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/35 (2013.01); H01J 37/3458 (2013.01);
Abstract
A magnetron sputtering system comprising a vacuum processing chamber having a chamber shield, a magnetron assembly, and a substrate, the magnetron assembly comprising a permanent magnetic assembly and an electromagnetic coil assembly, a first impedance circuit coupled between a power supply and the electromagnetic coil assembly, the first impedance circuit comprising a first resistor and a first capacitor, and a second impedance circuit having a second resistor and a second capacitor, and coupled between the substrate and a susceptor.