The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
May. 22, 2009
Olivier Marty, Lyons, FR;
Volodymyr Lysenko, Villeurbanne, FR;
Olivier Marty, Lyons, FR;
Volodymyr Lysenko, Villeurbanne, FR;
UNIVERSITE CLAUDE BERNARD LYON I, Villeurbanne, FR;
Abstract
The invention relates to a process for modifying the properties of a thin layer () formed on the surface of a support () forming a substrate () utilized in the field of microelectronics, nanoelectronics or microtechnology, nanotechnology, characterized in that it consists of: forming at least one thin layer () on a nanostructured support with high specific surface (), and treating the nanostructured support with high specific surface () to generate internal strains in the support causing its deformation at least in the plane of the thin layer so as to ensure corresponding deformation of the thin layer to modify its properties.