The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Nov. 03, 2011
Masahiro Ikeda, Tokyo, JP;
Hisashi Harada, Tokyo, JP;
Kazushi Hanakawa, Tokyo, JP;
Toshihiro Otani, Tokyo, JP;
Tadashi Katayose, Tokyo, JP;
Taizo Honda, Tokyo, JP;
Yukiko Yamada, Tokyo, JP;
Yuehu Pu, Tokyo, JP;
Masahiro Ikeda, Tokyo, JP;
Hisashi Harada, Tokyo, JP;
Kazushi Hanakawa, Tokyo, JP;
Toshihiro Otani, Tokyo, JP;
Tadashi Katayose, Tokyo, JP;
Taizo Honda, Tokyo, JP;
Yukiko Yamada, Tokyo, JP;
Yuehu Pu, Tokyo, JP;
MITSUBISHI ELECTRIC CORPORATION, Chiyoda-Ku, Tokyo, JP;
Abstract
A particle beam irradiation apparatus according to the present invention is provided with a vacuum duct that forms a vacuum region through which the charged particle beam passes, a vacuum window through which the charged particle beam is launched from the vacuum region, a scanning electromagnet that scans the charged particle beam; a monitoring apparatus including a position monitor that detects the passing position of a charged particle beam and the beam size thereof, a low-scattering gas filling chamber including the monitoring apparatus, and an irradiation management apparatus that controls irradiation of the charged particle beam; the particle beam irradiation apparatus is characterized in that the low-scattering gas filling chamber is changeably disposed in such a manner that the beam-axis-direction positional relationship between the monitoring apparatus and the vacuum window is a desired one and in that the low-scattering gas filling chamber is filled with a low-scattering gas.